[Since this document is being developed jointly with IEC, there will be no purpose clause (in accordance with IEC style).]This standard provides the methods for introduction of nanoelectronics into large scale, high volume production in semiconductor manufacturing facilities through the incorporation of nanomaterials (e.g., CNT, graphene, quantum dots, etc.) (fabs). This standard provides the method for introduction of nanomaterials into the fabs. This process is described as Raw Materials Acquisition, Materials Processing, Design, Integrated Circuit Fabrication, Testing, and End-Use.
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